In this paper, we investigated the localized anodization of aluminum evaporated on silicon substrate using micro scale patterns. Positive (S1818) and negative (SU-8 2035, KMPR 1010, KMPR 1035) photoresist patterns as well as $SiO_2$ micro patterns were fabricated on aluminum substrates respectively. Then, anodization of each substrate was performed in oxalic acid electrolyte. We observed the formation of aluminum/alumina patterns on a flat substrate by SEM images of its cross-section. This work provides an easy and simple technique for the fabrication of aluminum/alumina micro patterns by localized anodization.