This study applied a laser cleaning method (dry cleaning) that is used for cleaning semiconductor elements to dental implant cleaning. The lasers used in this study were pulsed fiber lasers with wavelengths of 1,064 and 532 nm. The peak output, energy per pulse, energy density per pulse, time of pulse experiment, and number of pulse experiments served as process variables for this study, and the variables were changed for each experiment. As a result, a laser with a wavelength of 532 nm showed much higher cleaning efficiency than its 1,064 nm counterpart. As the wavelength range decreased, the quantized energy increased and the reflection rate of the titanium used for the implant decreased; consequently, the energy absorption rate increased. Therefore, it is proposed that the energy density by wavelength has a greater influence on cleaning than does the output size.