Hydrophilic $SiO_2$ layers were obtained by the atmospheric-pressure plasma treatment. Superhydrophobic $SiO_2$ layers were first deposited by the electrospray deposition method. The electrospunable solution that was prepared based on the solgel method was sprayed on Si (100) substrates. The surface of the electrosprayed $SiO_2$ layers consisted of the agglomeration of nano-sized grains, which led to a very high roughness and revealed a very high contact angle to water droplets over $162^{circ}$. After having been exposed to the atmospheric $Ar/O_2$ plasma, the observed superhydrophobicity of the $SiO_2$ layers were greatly changed: a dramatic variation of the water contact angle from $162^{circ}$ to $3^{circ}$, namely realization of superhydrophillicity. Interestingly, the surface microstructure was almost preserved. According to the XPS analysis, it is more likely that thanks to the plasma exposure, the surface of $SiO_2$ layers will be cleaned in terms of organic species that are hydrophobic-inducing, consequently leading to the hydrophilic nature observed for the plasma-exposed $SiO_2$ layers.