H2, NH3, GeH4, DCS(Dichlorosilane) gases were caused an explosion and an environmental pollution in semiconductor chemical process when it was exhausted in air. It needs eliminate gases safely. So, An explosive and environmental pollution gases, exhausted in semiconductor chemical process, were removed by utilizing a plasma process. In this study, Hydrogen gas was used as an ignition gas of combustion for elimination an explosive and environmental pollution gases(H2, NH3, GeH4, DCS) in a semiconductor chemical process. It induced to safety combustion of hydrogen by supplying air sufficiently. Also, Plasma process wasutilized for gas combustion and high heat source(1,100 ℃) was produced by combustion of hydrogen. Hydrogen gas was utilized to combust NH3, GeH4, DCS gases safely and it was improved efficiency of elimination. It confirmed basic experimental conditions to experiment on single gas and mixed gases for elimination of H2, NH3, GeH4, DCS. An efficiency of single gas was H2 96%, NH3 97%, GeH4 99%, DCS 97%. Plasma torch shape was modified cylindrical to trapezium, It was improved an elimination efficiency of NH3 gas about 10% after modified torch shape. H2, NH3, GeH4, DCS gases combusted (>96%) safely by modified plasma torch shape in a system. Therefore, It was expected an energy saving and application of elimination gas system.