Silicon oxide films contained fluoro-alkyl functions(FAFs ; $CF_3$, $CF_2$ and CF functions) were prepared on the polycarbonate(PC), glass and Si substrates by rf plasma-enhanced CVD(PECVD). The fluoro-alkyl silanes(FASs ; $CF_3(CF_2)nCH_2CH_2Si(OCH_3)_3, ;n=0, 5, 7)$ were used as raw materials. The substrate temperature during deposition was around $50^{circ}C$. The obtained films had good water repellency. The maximum contact angle for a water drop was 107 degrees. The transmittance of the PC substrate was improved by the coating form 87% to 90%. These films also have a function as an antireflective coating.