We have developed a torch-type plasma generator to make low temperature material processings possible in open air conditions. By using this plasma torch, $TiO_2$ films were deposited on substrates exposed to air by feeding $Ti(OEt)_4$ into the plasma. XPS and X-ray analyses revealed that the films were stoichiometric and amorphous $TiO_2$, but Raman spectra indicated the existence of short-range crystallinity in the films. The phase structure of the films changed from anatase to rutile by the admixing of hydrogen in the plasma. The rutile $TiO_2$ film had a high breakdown electric field as well as a high dielectric constant.