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ANSOTROPIC LATTICE RELAXATION OF ZnSe EPILAYER GROWN ON (001) GaAs SUBSTRATE BY MOLECULAR BEAM EPITAXY
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  • ANSOTROPIC LATTICE RELAXATION OF ZnSe EPILAYER GROWN ON (001) GaAs SUBSTRATE BY MOLECULAR BEAM EPITAXY
  • ANSOTROPIC LATTICE RELAXATION OF ZnSe EPILAYER GROWN ON (001) GaAs SUBSTRATE BY MOLECULAR BEAM EPITAXY
저자명
Kim. C.S.,Noh. Y.K.,Cho. H.Y.,Yeom. H.Y.,Kim. Y.I.,Park. H.S.,Kim. T.I.
간행물명
Fabrication and Characterization of Advanced Materials
권/호정보
1995년|2권 |pp.1125-1130 (6 pages)
발행정보
한국재료학회
파일정보
정기간행물|ENG|
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
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기타언어초록

We have investigated asymmetric dislocation density and anisotropic lattice relaxation of ZnSe epitaxial layer grown on (001) GaAs substrate by MBE. Double-crystal X-ray rocking curves for (004) and {115} reflections were measured as a function of the azimuthal rotation angle of the sampel. For (004) reflection both the peak separation between the substrate and the epilayer and the FWHM of the epilayer peak vary sinusoidally as a funcion of the azimuthal angle. The results showed that the epilayer is tilted along [110] direction by 134" with respect to the substrate and also has a maximum value of FWHM along [110]. Fron {115} reflections it was found that the strain along [110] is smaller than that along [1-10], inducating that the layer suffered anisotropic lattice relaxation. The direction of larger relaxation is not consistent with that of the maximum FWHM corresponding to the high density of dislocations. The reuslt suggest that the asymmetry in dislcoation density is not responsible for the anisotropic relaxiation of the ZnSe epilayer.ayer.