The tungsten oxide thin films were prepared on $s_i$ wafer by using an electron-beam evaporation technique. Thickness and structure of tungsten oxide film degraded in various electrolytes were analyzed by Rutherford backscattering spectroscopy, Raman spectroscopy, X-ray photoelectron spectroscopy and scanning electron microscope. Thickness of $WO_3$ film was the most dissolved in 1M $H_2SO_4$ electrolytye. We have confirmed that the degradation of this films was accelerated by $H_2O$ in electrolytes. But the electronic structure of film degraded by electrolyte contained of glycerol was not changed as comparision with as-deposited film. The degradation may be attributed to a change of thickness and the surface morphology of the film.