Monte Carlo ion scattering program is improved with the single scattering methods where the total cross section and the mean free path are calculated as a function of atomic density during ion scattering in matter. The relations among the parameters of incident ions and substrate materials are investigated to the sputtering phenomena. The sputtering yield has been analyzed with the dependence on the incident ion species and energy, incident angle, and surface binding energy. The energy distribution of sputtered particles is discussed.