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Effect of Alternating Magnetic Field on Ion Activation in Low Temperature Polycrystalline Silicon Technology
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  • Effect of Alternating Magnetic Field on Ion Activation in Low Temperature Polycrystalline Silicon Technology
  • Effect of Alternating Magnetic Field on Ion Activation in Low Temperature Polycrystalline Silicon Technology
저자명
Hwang. Jin Ha,Lim. Tae Hyung
간행물명
반도체및디스플레이장비학회지
권/호정보
2004년|3권 1호|pp.35-39 (5 pages)
발행정보
한국반도체및디스플레이장비학회
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정기간행물|ENG|
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
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기타언어초록

Statistical design of experiments was successfully employed to investigate the effect of alternating magnetic field on activation of polycrystalline Si (p-Si) doped as n-type using $ extrm{PH}_3$, by full factorial design of three factors with two levels. In this design, the input variables are graphite size, alternating current, and activation time. The output parameter, sheet resistance, is analyzed in terms of the primary effects and multi-factor interactions. Notably, the three-factor interaction is calculated to be a dominant interaction. The interaction between graphite size and activation time and the main effect of current are important effects compared to the other variables and relevant interactions. Alternating magnetic flux activation is proved a significantly beneficial processing technique.