- Mueller Matrix Ellipsometry 제작 및 응용
- Development and Application of Mueller Matrix Ellipsometry
- ㆍ 저자명
- 방경윤,경재선,오혜근,김옥경,안일신
- ㆍ 간행물명
- 반도체및디스플레이장비학회지
- ㆍ 권/호정보
- 2004년|3권 1호|pp.31-34 (4 pages)
- ㆍ 발행정보
- 한국반도체및디스플레이장비학회
- ㆍ 파일정보
- 정기간행물| PDF텍스트
- ㆍ 주제분야
- 기타
We develop Mueller-matrix spectroscopic ellipsometry based on dual compensator configuration. This technique is very powerful for measuring surface anisotropy in nano-scale, especially when materials show depolarization. Dual-rotating compensator configuration is adopted with the rotational ratio of 5:3 originally developed by Collins et al[1]. The instrument can provide 250-point spectra over the wavelength range from 230 nm to 820 nm in one irradiance waveform with minimum acquisition time of Tc=10 s. In this work, the results obtained in transmission modes are presented for the initial attempt. We present calibration procedures to diagnose the system from the utilized data collected in transmission mode without sample. We expect that the instrument will have important applications in thin films and surfaces that have anisotropy and inhomogeneity.