- Slit-Coater내의 Photo Resist의 코팅 특성
- Coating Characteristics of Photo Resist in a Slit-Coater
- ㆍ 저자명
- 김장우,정진도,김성근
- ㆍ 간행물명
- 반도체및디스플레이장비학회지
- ㆍ 권/호정보
- 2004년|3권 3호|pp.41-44 (4 pages)
- ㆍ 발행정보
- 한국반도체및디스플레이장비학회
- ㆍ 파일정보
- 정기간행물| PDF텍스트
- ㆍ 주제분야
- 기타
The aim of this study is the confirmation of the coating uniformity affected by the surface tension and wall attachment angle in a slit-coater model. In this work, we use the commercial code (Fluent) to solve the two-phase flow formed with air and photo resist numerically. The results show that the surface tension is the most important factor to determine the coating efficiency in the view of coating uniformity, and the coating uniformity is 2% for our slit-coater model and conditions. To improve the coating uniformity, it is in need of minimization of the sidewall effect of slit-coater.