- Slit-Coater 노즐에서 Photo Resist의 유동 특성
- Flow Characteristics of Photo Resist in a Slit-Coater Nozzle
- ㆍ 저자명
- 김장우
- ㆍ 간행물명
- 반도체및디스플레이장비학회지
- ㆍ 권/호정보
- 2004년|3권 3호|pp.37-40 (4 pages)
- ㆍ 발행정보
- 한국반도체및디스플레이장비학회
- ㆍ 파일정보
- 정기간행물| PDF텍스트
- ㆍ 주제분야
- 기타
This study presents numerical solutions of three-dimensional laminar flow-field formed by photo resist flow in a slit-coater model. We discuss on the governing equations, laminar viscosities and the computational model applied in our numerical calculation and some results. We prove that the structure of tapered-cavity aid to make uniform pressure-field and boundary effect is an important problem to improve coating uniformity. In view of uniformity improvement, it is necessary to study for the structure of cavity and flow path.