- 양성자 조사법에 의한 고속스위칭 사이리스터의 제조
- ㆍ 저자명
- 김은동,장창리,김상철,김남균,Kim. Eun-Dong,Zhang. Changli,Kim. Sang-Cheol,Kim. Nam-Kyun
- ㆍ 간행물명
- 전기전자재료학회논문지
- ㆍ 권/호정보
- 2004년|17권 12호|pp.1264-1270 (7 pages)
- ㆍ 발행정보
- 한국전기전자재료학회
- ㆍ 파일정보
- 정기간행물| PDF텍스트
- ㆍ 주제분야
- 기타
A fast switching thyristor with a superior trade-off property between the on-state voltage drop and the turn-off time could be fabricated by the proton irradiation method. After making symmetric thyristor dies with a voltage rating of 1,600 V from 350 $mu$m thickness of 60 $Omega$ㆍcm NTD-Si wafer and 200 $mu$m width of n-base drift layer, the local carrier lifetime control by the proton irradiation was performed with help of the HI-13 tandem accelerator in China. The thyristor samples irradiated with 4.7 MeV proton beam showed a superior trade-off relationship of $V_{TM}$ = 1.55 V and $t_{q}$ = 15 $mu$s attributed to a very narrow layer of short carrier lifetime(~1 $mu$s) in the middle of its n-base drift region. To explain the small increase of $V_{TM}$ , we will introduce the effect of carrier compensation at the low carrier lifetime region by the diffusion current.ffusion current.t.