Recent emphasis on development of light-weight/high-temperature structural coatings for aerospace applications, e.g. hypersonic vehicles, has generated renewed interest in ordered intermetallics, especially titanium aluminides. Of the three binary intermetallics under consideration in this system ($Ti_3Al$, TiAl and $TiAl_3$ the first two have been more extensively studied. These intermetallics can be produced by sputter deposition from single target of the intermetallic compound of chosen composition. On the other hand, titanium aluminium nitride ((TiAI)N) film is anticipated as an advanced coating film with wear resistance used for drills, bites etc. and with corrosion resistance at a high temperature. In the present study, the thin films of TiAl and (TiAl)N were deposited at room temperature and elevated substrate temperature by using a two-facing-targets (TFT) type DC magnetron sputtering system with Al-rich (25Ti75Al atm%) composition of binary Ti-Al alloy target. (TiAl)N thin films were deposited using a mixture Ar and $N_2$ gases. The crystallization process of TiAl thin films have been studied by X-ray diffraction, fold-emission scanning electron microscope and transmission electron microscope. The results of the phase transformations of TiAl thin films by heating substrate are $Al+(Ti){ ightarrow}TiAl_2{ ightarrow}Ti_2Al_5$, phase transformations by annealing treatment are $Al{ ightarrow}(Ti)TiAl_2/Ti_2Al_5{ ightarrow}{alpha}TiAl_3/Ti_2Al/TiAl_3$. In case of (TiAl)N thin films, phase transformations are $TIN{ ightarrow}Ti_2AIN+TiN+AIN{ ightarrow}Ti_2AIN+AIN{ ightarrow}Ti_2AIN+TiN+AIN;for;Ar/N_2$ gas ratio of 3 : 1. The above results are discussed in terms of crystallized phases and microhardness.