- 밀도범함수를 이용한 정방정계-NiSi (010)/Si 계면 층의 구조 연구
- ㆍ 저자명
- 김대희,김대현,서화일,김영철,Kim. Dae-Hee,Kim. Dae-Hyun,Seo. Hwa-Il,Kim. Yeong-Cheol
- ㆍ 간행물명
- 전기전자재료학회논문지
- ㆍ 권/호정보
- 2009년|22권 5호|pp.377-381 (5 pages)
- ㆍ 발행정보
- 한국전기전자재료학회
- ㆍ 파일정보
- 정기간행물| PDF텍스트
- ㆍ 주제분야
- 기타
Tetragonal-NiSi (010)/Si superstructures were calculated for studying the interface structure using density functional theory, The orthorhombic-NiSi was changed to the tetragonal-NiSi to be matched with the Si surface for epitaxy interface. The eight interface models were produced by the type of the Si surfaces, The tetragonal-NiSi (010)/Si (020)[00-1] superstructure was energetically the most favorable, and the interface thickness of this superstructure was the shortest among the tetragonal-NiSi (010)/Si superstructures. However, in the case of tetragonal-NiSi (010)/Si (010)[00-1] superstructure, it was energetically the most unfavorable, and the interface thickness was the longest. The energies and interface thicknesses of tetragonal-NiSi (010)/Si superstructures were influenced by the coordination number of Ni atoms and the bond length between atoms located at the interface,