The photocatalytic decomposition characteristics of single n-pentane, n-pentane mixed with methyl ethyl ketone (MEK), and n-pentane mixed with ethyl acetate (EA) by cylindrical UV reactor installed with $TiO_2$-coated perforated plane were studied. The effects of the residence time, the inlet gas concentration, and the oxygen concentration were investigated. The removal efficiency of n-pentane was increased with increasing the residence time and the oxygen concentration, but decreased with increasing the inlet concentration of n-pentane. The photocatalytic decomposition rates of single n-pentane, n-pentane mixed with MEK, and n-pentane mixed with EA fitted well on Langmuir-Hinshelwood kinetics equation. The maximum elimination capacities of single n-pentane, n-pentane mixed with MEK, and n-pentane mixed with EA were obtained to be $465g/m^3{cdot}day$, $217g/m^3{cdot}day$, and $320g/m^3{cdot}day$, respectively. The presence of coexisting MEK and EA vapor had a negative effect on the photocatalytic decomposition of n-pentane and the negative effect of MEK was higher than that of EA.