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Reduction of metal-graphene contact resistance by direct growth of graphene over metal
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  • Reduction of metal-graphene contact resistance by direct growth of graphene over metal
  • Reduction of metal-graphene contact resistance by direct growth of graphene over metal
저자명
Seul Ki Hong,Seung Min Song,Onejae Sul,Byung Jin Cho
간행물명
Carbon LettersKCI
권/호정보
2013년|14권 3호(통권53호)|pp.171-174 (4 pages)
발행정보
한국탄소학회|한국
파일정보
정기간행물|ENG| 이미지(1.43MB)
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영문초록

The high quality contact between graphene and the metal electrode is a crucial factor in achieving the high performance of graphene transistors. However, there is not sufficient research about contact resistance reduction methods to improve the junction of metal-graphene. In this paper, we propose a new method to decrease the contact resistance between graphene and metal using directly grown graphene over a metal surface. The study found that the grown graphene over copper, as an intermediate layer between the copper and the transferred graphene, reduces contact resistance, and that the adhesion strength between graphene and metal becomes stronger. The results confirmed the contact resistance of the metalgraphene of the proposed structure is nearly half that of the conventional contact structure.

목차

1. Introduction
2. Experiments
3. Results and Discussion
4. Conclusions

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